DocumentCode
3079191
Title
Helicon theory revisited
Author
Chen, Francis F. ; Arnush, D.
Author_Institution
Dept. of Civil Eng., California Univ., Los Angeles, CA, USA
fYear
1996
fDate
3-5 June 1996
Firstpage
227
Abstract
Summary form only given. Analysis of experiments on helicon wave discharges have so far relied on a relatively simple formulation in which the electrons are assumed to be massless. Though this approximation is a good one at magnetic fields B above 100 G or so, it fails when applied to results at lower fields. Including the electron mass raises the governing equation to a fourth-order differential equation and gives rise to a new root, sometimes called the helicon-ECR mode, which is related to Trivelpiece-Gould modes. In general, the wave in the plasma is a mixture of the normal high-field helicon mode (Pi) and this low-field mode (β/sub 2/), and this mixture depends sensitively on the boundary conditions. In a plasma-filled conducting cylinder, the amplitude of β/sub 1/ is dominant at high magnetic fields; but β/sub 2/ becomes increasingly important as B is lowered, until for ω/sub c/<2ω, it is the only mode possible. Since β/sub 2/ has short radial wavelength and is highly damped, it is effectively a surface wave. If the conducting boundary is separated from the plasma by a small gap, the two modes become decoupled and can have arbitrary amplitudes. If the conductor is moved to infinity while the plasma is confined by an insulator, the two modes are again coupled, but with a different ratio of amplitudes. This interesting behavior has not yet been verified in experiment but will affect the design of low-field helicon sources being developed for plasma processing.
Keywords
discharges (electric); 100 G; Trivelpiece-Gould modes; boundary conditions; electron mass; fourth-order differential equation; helicon theory; helicon wave discharges; helicon-ECR mode; high-field helicon mode; low-field helicon sources; low-field mode; magnetic fields; plasma processing; plasma-filled conducting cylinder; surface wave; Boundary conditions; Differential equations; Electrons; Magnetic analysis; Magnetic fields; Plasma confinement; Plasma materials processing; Plasma sources; Plasma waves; Surface waves;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
Conference_Location
Boston, MA, USA
ISSN
0730-9244
Print_ISBN
0-7803-3322-5
Type
conf
DOI
10.1109/PLASMA.1996.551429
Filename
551429
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