Title :
Criteria for the research of new materials for opto-mechanical devices
Author :
Von de Muhll, R. ; Doumerc, Jean-Pierre ; Ravez, Jean ; Simon, Anrue
Author_Institution :
CNRS, Bordeaux I Univ., Gradignan, France
Abstract :
The technology allowing the transformation of light energy into mechanical deformation in a photo-mechanical device is reported. The most efficient materials used for designing such actuators are mainly ceramics made of ferroelectric oxides. They need to be polarised under high DC field in order to activate their piezoelectric properties. The origin of the photo-mechanical effect can be pyrostrictive or ferrostrictive. The most appropriate materials should exhibit both photo-ferroelectric and piezoelectric properties, so that appropriate dopings should increase their light-sensitivity as well as the piezoelectric coefficients. However, a number of parameters plays a part in optimising performances, mainly the composition but also chemical processing, sintering conditions, ceramic texture, orientation of the polarisation. Some improvements are proposed in order to increase the efficiency of such photostrictive actuators
Keywords :
dielectric polarisation; electrostriction; ferroelectric ceramics; photothermal effects; piezoceramics; piezoelectric actuators; pyroelectric devices; pyroelectricity; sintering; texture; actuators; ceramic texture; ceramics; chemical processing; ferroelectric oxides; ferrostrictive effect; high DC field; light-sensitivity; mechanical deformation; new materials; opto-mechanical devices; photo-ferroelectric properties; photo-mechanical device; photo-mechanical effect; photostrictive actuators; piezoelectric properties; polarisation orientation; pyrostrictive effect; sintering conditions; Capacitive sensors; Ceramics; Crystalline materials; Ferroelectric materials; Optical control; Optical materials; Optical modulation; Piezoelectric actuators; Piezoelectric materials; Piezoelectric polarization;
Conference_Titel :
Applications of Ferroelectrics, 1998. ISAF 98. Proceedings of the Eleventh IEEE International Symposium on
Conference_Location :
Montreux
Print_ISBN :
0-7803-4959-8
DOI :
10.1109/ISAF.1998.786761