• DocumentCode
    3084758
  • Title

    Two-dimensional device simulation for radio frequency performance of AlGaN/GaN HEMT

  • Author

    Lin-Qing Zhang ; Hong-Fan Huang ; Xiao-Yong Liu ; Jin-Shan Shi ; Zhuo Liu ; Sheng-Xun Zhao ; Peng-Fei Wang

  • Author_Institution
    State Key Lab. of ASIC & Syst., Fudan Univ., Shanghai, China
  • fYear
    2015
  • fDate
    15-16 March 2015
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    In order to obtain better high frequency performance for GaN-based devices, we investigate the influence of the gate length Lg, the gate-source space Lgs, the gate-drain space Lgd, and the thickness of barrier AlGaN on frequency performance of AlGaN/GaN high electron mobility transistors (HEMTs) using silvaco TCAD simulation. Besides, the importance of Ohmic contact resistance Rc to current-gain cutoff frequency fT is also presented by our simulation. It presents that the fT increases dramatically with the decrease of Lg and Rc while Lgd and Lgs affect fT lightly. Meanwhile, the optimized thickness of AlGaN barrier layer is obtained in our structure.
  • Keywords
    III-V semiconductors; aluminium compounds; contact resistance; gallium compounds; high electron mobility transistors; ohmic contacts; semiconductor device models; technology CAD (electronics); wide band gap semiconductors; AlGaN; GaN; HEMT; barrier layer; current-gain cutoff frequency; gate length; gate-drain space; gate-source space; high electron mobility transistor; ohmic contact resistance; radio frequency performance; silvaco TCAD simulation; two-dimensional device simulation; Aluminum gallium nitride; Gallium nitride; Logic gates; Radio frequency; Wide band gap semiconductors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Technology International Conference (CSTIC), 2015 China
  • Conference_Location
    Shanghai
  • ISSN
    2158-2297
  • Type

    conf

  • DOI
    10.1109/CSTIC.2015.7153324
  • Filename
    7153324