DocumentCode :
3084758
Title :
Two-dimensional device simulation for radio frequency performance of AlGaN/GaN HEMT
Author :
Lin-Qing Zhang ; Hong-Fan Huang ; Xiao-Yong Liu ; Jin-Shan Shi ; Zhuo Liu ; Sheng-Xun Zhao ; Peng-Fei Wang
Author_Institution :
State Key Lab. of ASIC & Syst., Fudan Univ., Shanghai, China
fYear :
2015
fDate :
15-16 March 2015
Firstpage :
1
Lastpage :
3
Abstract :
In order to obtain better high frequency performance for GaN-based devices, we investigate the influence of the gate length Lg, the gate-source space Lgs, the gate-drain space Lgd, and the thickness of barrier AlGaN on frequency performance of AlGaN/GaN high electron mobility transistors (HEMTs) using silvaco TCAD simulation. Besides, the importance of Ohmic contact resistance Rc to current-gain cutoff frequency fT is also presented by our simulation. It presents that the fT increases dramatically with the decrease of Lg and Rc while Lgd and Lgs affect fT lightly. Meanwhile, the optimized thickness of AlGaN barrier layer is obtained in our structure.
Keywords :
III-V semiconductors; aluminium compounds; contact resistance; gallium compounds; high electron mobility transistors; ohmic contacts; semiconductor device models; technology CAD (electronics); wide band gap semiconductors; AlGaN; GaN; HEMT; barrier layer; current-gain cutoff frequency; gate length; gate-drain space; gate-source space; high electron mobility transistor; ohmic contact resistance; radio frequency performance; silvaco TCAD simulation; two-dimensional device simulation; Aluminum gallium nitride; Gallium nitride; Logic gates; Radio frequency; Wide band gap semiconductors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Technology International Conference (CSTIC), 2015 China
Conference_Location :
Shanghai
ISSN :
2158-2297
Type :
conf
DOI :
10.1109/CSTIC.2015.7153324
Filename :
7153324
Link To Document :
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