DocumentCode
3084758
Title
Two-dimensional device simulation for radio frequency performance of AlGaN/GaN HEMT
Author
Lin-Qing Zhang ; Hong-Fan Huang ; Xiao-Yong Liu ; Jin-Shan Shi ; Zhuo Liu ; Sheng-Xun Zhao ; Peng-Fei Wang
Author_Institution
State Key Lab. of ASIC & Syst., Fudan Univ., Shanghai, China
fYear
2015
fDate
15-16 March 2015
Firstpage
1
Lastpage
3
Abstract
In order to obtain better high frequency performance for GaN-based devices, we investigate the influence of the gate length Lg, the gate-source space Lgs, the gate-drain space Lgd, and the thickness of barrier AlGaN on frequency performance of AlGaN/GaN high electron mobility transistors (HEMTs) using silvaco TCAD simulation. Besides, the importance of Ohmic contact resistance Rc to current-gain cutoff frequency fT is also presented by our simulation. It presents that the fT increases dramatically with the decrease of Lg and Rc while Lgd and Lgs affect fT lightly. Meanwhile, the optimized thickness of AlGaN barrier layer is obtained in our structure.
Keywords
III-V semiconductors; aluminium compounds; contact resistance; gallium compounds; high electron mobility transistors; ohmic contacts; semiconductor device models; technology CAD (electronics); wide band gap semiconductors; AlGaN; GaN; HEMT; barrier layer; current-gain cutoff frequency; gate length; gate-drain space; gate-source space; high electron mobility transistor; ohmic contact resistance; radio frequency performance; silvaco TCAD simulation; two-dimensional device simulation; Aluminum gallium nitride; Gallium nitride; Logic gates; Radio frequency; Wide band gap semiconductors;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Technology International Conference (CSTIC), 2015 China
Conference_Location
Shanghai
ISSN
2158-2297
Type
conf
DOI
10.1109/CSTIC.2015.7153324
Filename
7153324
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