DocumentCode
3084902
Title
Comprehensive investigation and design of Tunnel FET-based SRAM
Author
Hao Zhu ; Qianqian Huang ; Lingyi Guo ; Libo Yang ; Ye Le ; Ru Huang
Author_Institution
Shenzhen Grad. Sch., Peking Univ., Shenzhen, China
fYear
2015
fDate
15-16 March 2015
Firstpage
1
Lastpage
3
Abstract
In this work, the impacts of electrical characteristics of Tunnel FET (TFET) on the SRAM design are systemically investigated for the first time from the perspective of memory array. A novel 10T TFET SRAM design is also proposed to overcome the challenges and improve the circuit stability. By using a calibrated compact model, the simulated static power of 10T TFET SRAM can be much lower than traditional 6T MOSFET SRAM, especially at the low supply voltage of 0.5V. In addition, the cell´s stability is also largely improved with the largest noise margin compared with reported 7T TFET SRAM design and traditional 6T MOSFET SRAM.
Keywords
SRAM chips; circuit stability; field effect transistors; calibrated compact model; circuit stability; electrical characteristics; memory array; noise margin; simulated static power; tunnel FET-based SRAM; voltage 0.5 V; Automation; MOSFET; MOSFET circuits; Random access memory;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Technology International Conference (CSTIC), 2015 China
Conference_Location
Shanghai
ISSN
2158-2297
Type
conf
DOI
10.1109/CSTIC.2015.7153332
Filename
7153332
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