• DocumentCode
    3084902
  • Title

    Comprehensive investigation and design of Tunnel FET-based SRAM

  • Author

    Hao Zhu ; Qianqian Huang ; Lingyi Guo ; Libo Yang ; Ye Le ; Ru Huang

  • Author_Institution
    Shenzhen Grad. Sch., Peking Univ., Shenzhen, China
  • fYear
    2015
  • fDate
    15-16 March 2015
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    In this work, the impacts of electrical characteristics of Tunnel FET (TFET) on the SRAM design are systemically investigated for the first time from the perspective of memory array. A novel 10T TFET SRAM design is also proposed to overcome the challenges and improve the circuit stability. By using a calibrated compact model, the simulated static power of 10T TFET SRAM can be much lower than traditional 6T MOSFET SRAM, especially at the low supply voltage of 0.5V. In addition, the cell´s stability is also largely improved with the largest noise margin compared with reported 7T TFET SRAM design and traditional 6T MOSFET SRAM.
  • Keywords
    SRAM chips; circuit stability; field effect transistors; calibrated compact model; circuit stability; electrical characteristics; memory array; noise margin; simulated static power; tunnel FET-based SRAM; voltage 0.5 V; Automation; MOSFET; MOSFET circuits; Random access memory;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Technology International Conference (CSTIC), 2015 China
  • Conference_Location
    Shanghai
  • ISSN
    2158-2297
  • Type

    conf

  • DOI
    10.1109/CSTIC.2015.7153332
  • Filename
    7153332