DocumentCode :
3084951
Title :
Photoluminescence and cathodoluminescence of ion implanted ZnS and ZnGa/sub 2/O/sub 4/ phosphors
Author :
Kalkhoran, N.M. ; Halverson, W.
Author_Institution :
Spire Corp., Bedford, MA, USA
fYear :
1996
fDate :
3-5 June 1996
Firstpage :
245
Abstract :
Summary form only given. Photoluminescence (PL) and cathodoluminescence (CL) characteristics of ion implanted ZnS and ZnGa/sub 2/O/sub 4/ phosphors have been investigated. The host ZnS material was prepared by chemical vapor deposition and ZnGa/sub 2/O/sub 4/ thin films were deposited by RF sputtering. We have demonstrated high efficiency, well-saturated red, green, and blue PL and CL in ZnGa/sub 2/O/sub 4/ thin films implanted with Eu/sup +/, Mn/sup +/, and Ga/sup +/ ions, respectively. Our results indicate that the luminescence of these phosphors is critically dependent on the post-implantation annealing conditions. High efficiency green and blue PL and CL have been demonstrated in ion implanted ZnS:Cu,Al and ZnS:Ag,Al, respectively. We have shown that tellurium implantation produces a red shift of the characteristic pi, in ZnS:Mn/sup +2/ (using 325 nm HeCd laser) from 588 nm to 652 nm; the same ZnS(Te):Mn films under CL excitation show a more moderate shift toward the red. Selenium implantation has also been used successfully to modify ZnS phosphor host material and extend its PL and CL color gamut.
Keywords :
cathodoluminescence; 325 nm; 588 to 652 nm; HeCd; HeCd laser; RF sputtering; ZnGa/sub 2/O/sub 4/; ZnGa/sub 2/O/sub 4/:Eu; ZnGa/sub 2/O/sub 4/:Ga; ZnGa/sub 2/O/sub 4/:Mn; ZnS; ZnS(Se):Mn; ZnS(Te):Mn; ZnS:Ag,Al; ZnS:Cu,Al; ZnS:Mn; ZnS:Mn/sup +2/; cathodoluminescence; chemical vapor deposition; field emission display; multi-color activators; patterning steps; phosphor deposition; phosphors; photoluminescence; plasma display panels; post-implantation annealing conditions; red shift; thin film electroluminescent displays; thin films; Annealing; Chemical vapor deposition; Laser modes; Luminescence; Phosphors; Photoluminescence; Radio frequency; Sputtering; Tellurium; Zinc compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
Conference_Location :
Boston, MA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-3322-5
Type :
conf
DOI :
10.1109/PLASMA.1996.551472
Filename :
551472
Link To Document :
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