DocumentCode :
3085163
Title :
Recent development of nitride semiconductor electronic devices for next generation wireless communications
Author :
Nanishi, Yasushi
Author_Institution :
Dept. of Photonics, Ritsumeikan Univ., Shiga, Japan
fYear :
2004
fDate :
15-16 March 2004
Firstpage :
12
Lastpage :
17
Abstract :
This paper reviews potential and present status of AlGaN/GaN HFETs. High potential of these devices for high-power and high-frequency operation are explained from the physical properties of GaN and AlGaN/GaN hetero-structures. Present status of theses device performances are briefly introduced. Over 150 W operation at 2 GHz and 3.2 W operation at 30 GHz has been already achieved so far, verifying high-potential of this :material system. Issues for further improvements of these device performances as well as issues for production level technology are discussed.
Keywords :
III-V semiconductors; aluminium compounds; field effect transistors; gallium compounds; telecommunication equipment; wide band gap semiconductors; 150 W; 2 GHz; 3.2 W; 30 GHz; AlGaN-GaN; AlGaN/GaN HFETs; high-frequency operation; high-power operation; next generation wireless communications; nitride semiconductor electronic devices; Conducting materials; Electric breakdown; Gallium nitride; HEMTs; MODFETs; Production; Research and development; Semiconductor materials; Thermal conductivity; Wireless communication;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Junction Technology, 2004. IWJT '04. The Fourth International Workshop on
Print_ISBN :
0-7803-8191-2
Type :
conf
DOI :
10.1109/IWJT.2004.1306747
Filename :
1306747
Link To Document :
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