Title :
Dynamic analysis of electrostatic actuators using radial basis function collocation method
Author_Institution :
Dept. of Electr. Eng., Nat. Penghu Univ., Penghu, Taiwan
Abstract :
Dynamic problems of actuators are numerically formulated by adopting the radial basis function collocation method. Electrostatic actuation is achieved by applying a voltage difference between the opposite electrode and the deformable beam. The partial differential equations of actuator dynamic problems are then transformed into a discrete eigenvalue problem by utilizing the radial basis function collocation method. The actuator model considers those factors affecting the dynamic behavior of electrostatic actuators, i.e. the taper ratio, residual stress, beam length and gap size. Numerical results obtained using the radial basis function collocation method are compared with numerical results derived by using the differential quadrature method to assess the efficiency and systematic procedure of this novel approach for nonlinear differential equations. The radial basis function collocation method is a highly effective numerical technique for deriving partial differential equations.
Keywords :
beams (structures); deformation; eigenvalues and eigenfunctions; electrostatic actuators; internal stresses; nonlinear differential equations; partial differential equations; actuator dynamic problem; beam length; deformable beam; differential quadrature method; discrete eigenvalue problem; dynamic analysis; dynamic behavior; electrode; electrostatic actuator; gap size; nonlinear differential equation; partial differential equation; radial basis function collocation method; residual stress; taper ratio; voltage difference; Capacitors; Deformable models; Electrodes; Electrostatic actuators; Electrostatic analysis; Finite element methods; Numerical models; Partial differential equations; Radio frequency; Voltage; electrostatic actuator; microelectromechanical system; nonlinear analysis; pull-in; radial basis function;
Conference_Titel :
Industrial Electronics and Applications (ICIEA), 2010 the 5th IEEE Conference on
Conference_Location :
Taichung
Print_ISBN :
978-1-4244-5045-9
Electronic_ISBN :
978-1-4244-5046-6
DOI :
10.1109/ICIEA.2010.5514732