Title :
Ferroelectric negative capacitance hetero-tunnel field-effect-transistors with internal voltage amplification
Author :
Lee, Moon Ho ; Lin, Jia-Chin ; Wei, Y.-T. ; Chen, Chia-Wei ; Tu, Wen-Hua ; Zhuang, H.-K. ; Tang, M.
Author_Institution :
Inst. of Electro-Opt. Sci. & Technol., Nat. Taiwan Normal Univ., Taipei, Taiwan
Abstract :
The ferroelectric negative capacitance (NC) hetero-tunnel FET is fabricated for the first time, demonstrating the significant improvement in subthreshold swing (~double slope) and peak gm (118% enhancement) due to the internal voltage amplification. The peak gm enhancement at small VDS (-0.1V) indicates the intrinsic benefit by NC without lateral bias. The concept of coupling the ferroelectric polarization is proposed and synergistically contributes to the performance in future applications of steep subthreshold slope devices.
Keywords :
capacitance; ferroelectricity; field effect transistors; tunnel transistors; ferroelectric negative capacitance; ferroelectric polarization; hetero-tunnel field effect transistors; internal voltage amplification; steep subthreshold slope devices; Capacitance; Field effect transistors; Hafnium compounds; Iron; Logic gates; Silicon; Tin;
Conference_Titel :
Electron Devices Meeting (IEDM), 2013 IEEE International
Conference_Location :
Washington, DC
DOI :
10.1109/IEDM.2013.6724561