DocumentCode :
3086050
Title :
Generation 2 High Voltage Heterojunction Bipolar Transistor technology for high efficiency base station power amplifiers
Author :
Landon, T.R. ; Delaney, Joe ; Steinbeiser, C.F. ; Krutko, O.B. ; Branson, Roger ; Hajji, Rached ; Page, P. ; Wey, S. ; Hall, C. ; Witkowski, L.
Author_Institution :
TriQuint Semiconductor, Richardson, USA
fYear :
2010
fDate :
23-28 May 2010
Firstpage :
1
Lastpage :
1
Abstract :
A new generation of High Voltage Heterojunction Bipolar Transistor (HVHBT) technology was developed for base station high power amplifiers and multi-stage driver amplifiers. This is an improved version of previously reported InGaP/GaAs HBT capable of operating with supply voltages up to 32 V. Generation 2 HVHBT technology maintains the same high level of efficiency and compatibility with Digital Pre-Distortion (DPD) techniques but has higher gain, higher power density and greater tolerance to load mismatch and input overdrive. Two discrete power transistors, 120 W and 220 W, were developed using Generation 2 HVHBT technology for 2.1 GHz WCDMA/LTE applications. Both 2x120 W and 2x220 W Doherty amplifiers were designed to demonstrate gain approaching 14 dB and efficiency in excess of 55% at 6 dB operating back-off.
Keywords :
Base stations; Driver circuits; Gain; Gallium arsenide; Heterojunction bipolar transistors; High power amplifiers; Multiaccess communication; Power generation; Power transistors; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium Digest (MTT), 2010 IEEE MTT-S International
Conference_Location :
Anaheim, CA
ISSN :
0149-645X
Print_ISBN :
978-1-4244-6056-4
Electronic_ISBN :
0149-645X
Type :
conf
DOI :
10.1109/MWSYM.2010.5514775
Filename :
5514775
Link To Document :
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