• DocumentCode
    3086088
  • Title

    Techniques towards GaN power transistors with improved high voltage dynamic switching properties

  • Author

    Wurfl, Joachim ; Hilt, O. ; Bahat-Treidel, E. ; Zhytnytska, R. ; Kotara, P. ; Brunner, Frank ; Krueger, O. ; Weyers, M.

  • Author_Institution
    Leibniz Inst. fur Hochstfrequenztechnik, Ferdinand-Braun-Inst., Berlin, Germany
  • fYear
    2013
  • fDate
    9-11 Dec. 2013
  • Abstract
    Dynamic switching limitations of GaN power devices are analyzed and techniques towards improving fast high voltage switching are proposed and verified experimentally with an emphasis on optimized epitaxial buffer designs. Normally-off and normally-on GaN transistors are presented; depending on specific technology the dynamic on-state resistance increase reduces to a factor of 2.5 for 500 V switching from off-state drain bias. Normally-off transistors using p-GaN gate technology demonstrated a RonxQg product of 0.4 ΩnC for switching at 400 V drain bias.
  • Keywords
    III-V semiconductors; gallium compounds; power integrated circuits; power transistors; wide band gap semiconductors; GaN power devices; GaN power transistors; dynamic on-state resistance; epitaxial buffer designs; high voltage dynamic switching properties; high voltage switching; normally-off GaN transistors; normally-on GaN transistors; off-state drain bias; p-GaN gate technology; voltage 400 V; voltage 500 V; Aluminum gallium nitride; Electric breakdown; Gallium nitride; Logic gates; Resistance; Switches; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2013 IEEE International
  • Conference_Location
    Washington, DC
  • Type

    conf

  • DOI
    10.1109/IEDM.2013.6724571
  • Filename
    6724571