DocumentCode :
3086109
Title :
Total current collapse in high-voltage GaN MIS-HEMTs induced by Zener trapping
Author :
Jin, Di ; Joh, Jungwoo ; Krishnan, Sridhar ; Tipirneni, Naveen ; Pendharkar, Sameer ; del Alamo, Jesus A.
Author_Institution :
Microsyst. Technol. Labs., Massachusetts Inst. of Technol., Cambridge, MA, USA
fYear :
2013
fDate :
9-11 Dec. 2013
Abstract :
We investigate current collapse in GaN MIS-HEMTs for >600 V operation. Extreme trapping leading to total current collapse has been observed after OFF-state stress at high voltage. We attribute this to high-field tunneling-induced electron trapping (“Zener trapping”) inside the AlGaN barrier or the GaN channel layers. The trapping takes place in a narrow region right under the edge of the outermost field plate in the drain portion of the device. The trapping characteristics are consistent with those responsible for the yellow luminescence band in GaN or AlGaN. This finding gives urgency to defect control during epitaxial-growth and the design of appropriate field plate structures for the reliable high-voltage operation of MIS-HEMTs.
Keywords :
III-V semiconductors; MIS devices; Zener effect; aluminium compounds; electron traps; epitaxial growth; gallium compounds; high electron mobility transistors; wide band gap semiconductors; AlGaN; AlGaN barrier; GaN; GaN MIS-HEMT; GaN channel layers; OFF-state stress; Zener trapping; current collapse; defect control; epitaxial-growth; extreme trapping; field plate structures; high-field tunneling-induced electron trapping; trapping characteristics; yellow luminescence band; Aluminum gallium nitride; Charge carrier processes; Electric fields; Gallium nitride; Logic gates; Stress; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2013 IEEE International
Conference_Location :
Washington, DC
Type :
conf
DOI :
10.1109/IEDM.2013.6724572
Filename :
6724572
Link To Document :
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