Widely tunable high-Q SIW filter using plasma material

Author

Djermoun, A. ; Prigent, G. ; Raveu, N. ; Callegari, T.

fYear

2010

fDate

23-28 May 2010

Firstpage

1484

Lastpage

1486

Abstract

This paper presents a novel concept to tune the resonant frequency of an evanescent-mode substrate integrated waveguide resonator while maintaining a high-Q in the tuned frequency range. The tunability is based on the insertion of vertical switchable capacitive post within SIW cavity. The filter is tuned from 18 GHz to 7.5 GHz, with insertion losses ranging from 0.8 to 2 dB in the frequency range for 1.4% bandwidth filter. The main interest of this work is the use of the argon material under high pressure and DC voltage to generate a dense plasma media.

Keywords

filters; plasma materials processing; resonators; SIW cavity; argon material; bandwidth filter; dense plasma media; evanescent-mode substrate integrated waveguide resonator; insertion losses; plasma material; resonant frequency; tunability; tuned frequency range; vertical switchable capacitive post; widely tunable high-Q SIW filter; Argon; Bandwidth; DC generators; Insertion loss; Plasma density; Plasma materials processing; Plasma waves; Resonant frequency; Resonator filters; Voltage; Evanescent mode filters; plasma materials; substrate integrated waveguide; tunable filters;

fLanguage

English

Publisher

ieee

Conference_Titel

Microwave Symposium Digest (MTT), 2010 IEEE MTT-S International

Conference_Location

Anaheim, CA

ISSN

0149-645X

Print_ISBN

978-1-4244-6056-4

Electronic_ISBN

0149-645X

Type

conf

DOI

10.1109/MWSYM.2010.5514787

Filename

5514787