DocumentCode
3086569
Title
A novel SiGe/Si hetero-junction power diode utilizing an ideal ohmic contact
Author
Li, Ma ; Yong, Gao
Author_Institution
Dept. of Appl. Phys., Xi´´an Univ. of Technol., China
fYear
2004
fDate
15-16 March 2004
Firstpage
263
Lastpage
266
Abstract
Novel structure to realize an ideal ohmic contact with the n+ region substituted by p+-n+ mosaic structure for the p+(SiGe)-n--n+ hetero-junction switching power diodes is proposed. The reverse recovery characteristics of p+(SiGe)-n--n+ diodes utilizing an ideal ohmic contact are much more improved but not notably sacrificing the forward voltage drop. there are about two thirds shorter in the reverse recovery time and a half shorter in peak reverse current than conventional p+(SiGe)-n--n+ diodes, furthermore, far lower leakage current is exhibited. The new kind of high-speed and soft p+(SiGe)-n--n+ diode is easily incorporated into monolithic combination with transistors, and is useful for various power applications. These improvements are achieved without resorting lifetime killing and thus the devices can be easily integrated into power ICs.
Keywords
Ge-Si alloys; ohmic contacts; power semiconductor diodes; power semiconductor switches; silicon; SiGe-Si; forward voltage drop; heterojunction power diode; high-speed soft diode; ideal ohmic contact; mosaic layer; power IC; reverse recovery characteristics; switched-mode power supplies; switching power diodes; universal contact; Analytical models; BiCMOS integrated circuits; Charge carrier processes; Diodes; Electrons; Germanium silicon alloys; Leakage current; Ohmic contacts; Silicon germanium; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Junction Technology, 2004. IWJT '04. The Fourth International Workshop on
Print_ISBN
0-7803-8191-2
Type
conf
DOI
10.1109/IWJT.2004.1306851
Filename
1306851
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