DocumentCode
3087095
Title
Widely tunable high-Q filter using plasma material
Author
Djermoun, A. ; Prigent, Gaetan ; Raveu, N. ; Callegari, T.
Author_Institution
Laplace-GRE, France
fYear
2010
fDate
23-28 May 2010
Firstpage
1
Lastpage
1
Abstract
This paper presents a novel concept to tune the resonant frequency of an evanescent-mode substrate integrated waveguide resonator while maintaining a high-Q in the tuned frequency range. The tunability is based on the insertion of vertical switchable capacitive post within SIW cavity. The filter is tuned from 18 GHz to 7.5 GHz, with insertion losses ranging from 0.8 dB to 2 dB in the frequency range for 1.4% bandwidth filter. The main interest of this work is the use of argon material under high pressure and DC voltage to generate a dense plasma media.
Keywords
Q-factor; argon; cavity resonator filters; microwave filters; SIW cavity; argon material; evanescent-mode substrate integrated waveguide resonator; frequency 18 GHz to 7.5 GHz; plasma material; resonant frequency; vertical switchable capacitive post; widely tunable high-Q filter; Argon; Bandwidth; DC generators; Insertion loss; Plasma density; Plasma materials processing; Plasma waves; Resonant frequency; Resonator filters; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Symposium Digest (MTT), 2010 IEEE MTT-S International
Conference_Location
Anaheim, CA
ISSN
0149-645X
Print_ISBN
978-1-4244-6056-4
Electronic_ISBN
0149-645X
Type
conf
DOI
10.1109/MWSYM.2010.5514819
Filename
5514819
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