DocumentCode :
3087929
Title :
Impact of layout at advanced technology nodes on the performance and variation of digital and analog figures of merit
Author :
Saxena, Shanky ; Dolainsky, Christoph ; Lunenborg, Meindert ; Jianjun Cheng ; Yu, Bei ; Vallishayee, Rakesh ; Ciplickas, Dennis
Author_Institution :
PDF Solutions, Richardson, TX, USA
fYear :
2013
fDate :
9-11 Dec. 2013
Abstract :
New technologies and integration schemes introduced over the last few generations have increased the sensitivity of transistor performance and variation to its layout and environment. This paper describes an infrastructure for efficient statistical characterization of the transistor variation. The impact of the increased sensitivity of transistor characteristics to its layout and environment is illustrated through a variety of figures of merit for digital, analog and RF design. Examples of layout parameters and their interaction that cause a large variation in these figures of merit illustrate the applications of this infrastructure.
Keywords :
integrated circuit layout; RF design; analog figures of merit; digital figures of merit; statistical characterization; transistor performance; Layout; Logic gates; MOS devices; Radio frequency; Sensitivity; Standards; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2013 IEEE International
Conference_Location :
Washington, DC
Type :
conf
DOI :
10.1109/IEDM.2013.6724646
Filename :
6724646
Link To Document :
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