Title :
Carrier response in band gap and multiband transport in bilayer graphene under the ultra-high displacement
Author :
Nagashio, K. ; Kanayama, K. ; Nishimura, T. ; Toriumi, A.
Author_Institution :
Dept. of Mater. Eng., Univ. of Tokyo, Tokyo, Japan
Abstract :
We demonstrate the ultra-high displacement (D) of ~8 V/nm (n = ~4×1013 cm-2) in bilayer graphene using the solid state Y2O3 top gate, which has been reached only by the ion gating so far. The systematic comparison of I-V and C-V curves at high D elucidates that the carriers in bilayer graphene electrically communicate with trap sites within the band gap and that the filling of carriers in the high energy sub-bands results in the reduction of the conductivity due to the inter-band scattering.
Keywords :
carrier relaxation time; energy gap; graphene; multilayers; yttrium compounds; C; C-V curves; I-V curves; Y2O3; band gap; bilayer graphene; carrier response; inter-band scattering; ion gating; multiband transport; solid state top gate; ultra-high displacement; Capacitance-voltage characteristics; Conductivity; Graphene; Logic gates; Photonic band gap; Quantum capacitance;
Conference_Titel :
Electron Devices Meeting (IEDM), 2013 IEEE International
Conference_Location :
Washington, DC
DOI :
10.1109/IEDM.2013.6724661