Title :
High stability fluorinated zinc oxide thin film transistor and its application on high precision active-matrix touch panel
Author :
Zhi Ye ; Man Wong ; Man-Tik Ng ; Luo, Jack K.
Author_Institution :
Dept. of Inf. Sci. & Electron. Eng., Zhejiang Univ., Hangzhou, China
Abstract :
We present fluorinated ZnO (F-ZnO) TFT to overcome the native drawback of pure ZnO TFT. At a optimum F concentration of ~1020/cm3, it exhibits high field-effect mobility of ~71cm2/Vs, low sub-threshold slope (SS) of 0.18V/decade, high reliability, good uniformity and light insensitivity, The improvement is attributed to the passivation effect of F. Based on the high performance F-ZnO TFTs, a novel active-matrix self-capacitive touch panel was firstly realized. This touch technology combined the functions of high precise stylus handwriting and sensitive multi-touch, which will be the trend of the development of the next-genaration high precision touch panel.
Keywords :
II-VI semiconductors; passivation; thin film transistors; touch sensitive screens; zinc compounds; ZnO; active-matrix self-capacitive touch panel; field-effect mobility; fluorinated TFT; fluorinated zinc oxide thin film transistor; high precise stylus handwriting; light insensitivity; passivation effect; touch technology; Conductivity; Films; Passivation; Plasmas; Thin film transistors; Zinc oxide;
Conference_Titel :
Electron Devices Meeting (IEDM), 2013 IEEE International
Conference_Location :
Washington, DC
DOI :
10.1109/IEDM.2013.6724702