Title :
New observations on complex RTN in scaled high-κ/metal-gate MOSFETs — The role of defect coupling under DC/AC condition
Author :
Pengpeng Ren ; Peng Hao ; Changze Liu ; Runsheng Wang ; Xiaobo Jiang ; Yingxin Qiu ; Ru Huang ; Shaofeng Guo ; Mulong Luo ; Jibin Zou ; Meng Li ; Jianping Wang ; Jingang Wu ; Jinhua Liu ; Weihai Bu ; Waisum Wong ; Yu, Son-Cheol ; Hanming Wu ; Shiuh-Wuu Le
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
Abstract :
The coupling effect between multi-traps in complex RTN is experimentally studied in scaled high-κ/metal-gate MOSFETs for the first time. By using extended STR method, the narrow “test window” of complex RTN is successfully expanded to full VG swing. Evident defect coupling can be observed in both RTN amplitude and time constants. Interesting nonmonotonic bias-dependence of defect coupling is found, which is due to two competitive mechanisms of Coulomb repulsion and channel percolation conduction. The decreased defect coupling is observed with increasing AC frequency. Based on the new observations on complex RTN, its impacts on the circuit stability are also evaluated, which show an underestimation of the transient performance if not considering defect coupling. The results are helpful for future robust circuit design against RTN.
Keywords :
MOSFET; crystal defects; high-k dielectric thin films; integrated circuit design; random noise; Coulomb repulsion; RTN amplitude; channel percolation conduction; circuit stability; complex RTN; coupling effect; defect coupling; extended STR method; metal gate MOSFET; robust circuit design; scaled high k MOSFET; time constants; Circuit stability; Circuit synthesis; Couplings; Current density; MOSFET; Market research; Robustness;
Conference_Titel :
Electron Devices Meeting (IEDM), 2013 IEEE International
Conference_Location :
Washington, DC
DOI :
10.1109/IEDM.2013.6724731