DocumentCode :
3089849
Title :
Analysis of DC/transient current and RTN behaviors related to traps in p-GaN gate HEMT
Author :
Jong-Ho Bae ; Sunkyu Hwang ; Jongmin Shin ; Hyuck-In Kwon ; Chan Hyeong Park ; Hyoji Choi ; Jong-Bong Park ; Jongseob Kim ; Jongbong Ha ; Kiyeol Park ; Jaejoon Oh ; Jaikwang Shin ; U-In Chung ; Kwang-Seok Seo ; Jong-Ho Lee
Author_Institution :
Sch. of EECS & ISRC, Seoul Nat. Univ., Seoul, South Korea
fYear :
2013
fDate :
9-11 Dec. 2013
Abstract :
Trap-related transient characteristics and RTN in p-GaN gate HEMT were characterized, for the first time to our knowledge. Current conduction mechanism in DC IG is explained based on proposed model. Hopping conduction mechanism is responsible for IG at VG <; 0. IG at VG > 0 seems to be controlled by thermionic emission and affected by the action of floating-base n(W)-p(p-GaN)-n(AlGaN/GaN) bipolar transistor. Transient current behavior is related to the DC conduction mechanism and could be explained by thermal emission and charge trapping in p-GaN and AlGaN layers. Measured transient behavior of gate capacitance corresponds to that of the transient currents. Hole trapping into the AlGaN layer and existence of percolation path in gate and drain currents are verified by analyzing RTNs in IG and ID. Trap position and activation energy regarding RTN are firstly extracted. RTN time constants are similar to those in IG and ID transient behavior.
Keywords :
III-V semiconductors; aluminium compounds; bipolar transistors; gallium compounds; high electron mobility transistors; hole traps; thermionic emission; transient analysis; wide band gap semiconductors; AlGaN-GaN; DC conduction mechanism; DC-transient current analysis; RTN behaviors; RTN time constants; activation energy; charge trapping; current conduction mechanism; drain currents; floating-base bipolar transistor; gate capacitance; gate currents; hole trapping; hopping conduction mechanism; p-GaN gate HEMT; percolation path; thermal emission; thermionic emission; trap position; trap-related transient characteristics; Aluminum gallium nitride; Electron traps; Gallium nitride; HEMTs; Logic gates; Transient analysis;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2013 IEEE International
Conference_Location :
Washington, DC
Type :
conf
DOI :
10.1109/IEDM.2013.6724733
Filename :
6724733
Link To Document :
بازگشت