Title :
Numerical calculation of electromagnetic eigenfields and dispersion relation for slow-wave device simulation
Author :
Oslake, J.M. ; Verboncoeur, John P. ; Birdsall, C.K.
Author_Institution :
Electron. Res. Lab., California Univ., Berkeley, CA, USA
Abstract :
Summary form only given. Slow-wave structures support microwave amplification via electromagnetic coupling with an injected electron beam. Critical in the design of such devices is the dependence of the dispersion relation on the geometry of the guiding structure. The dispersion relation provides phase and group velocities, and the fields provide the impedence as seen by the beam. To this end, a computer model is developed which first numerically solves a wave equation in finite difference form subject to boundary conditions periodic in z and conducting elsewhere. The direction of wave propagation is along the z-axis. The solution produces a sequence of eigenfrequencies and eigenfields beginning with cut-off. Fourier decomposition of each eigenfield along selected mesh lines coincident with the location of the electron beam is then performed to establish a correspondence between eigenfrequency and wave number. From this data the dispersion relation for the slow-wave structure can then be formed.
Keywords :
slow wave structures; Fourier decomposition; computer model; dispersion relation; eigenfrequencies; eigenfrequency; electromagnetic coupling; electromagnetic eigenfields; electron beam; finite difference form; guiding structure geometry; injected electron beam; microwave amplification; numerical calculation; numerical solutions; slow-wave device simulation; slow-wave structures; wave equation; wave propagation; Dispersion; Electromagnetic devices; Electron beams; Finite difference methods; Geometry; Impedance; Laboratories; Magnetic confinement; Masers; Partial differential equations;
Conference_Titel :
Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-3322-5
DOI :
10.1109/PLASMA.1996.551497