• DocumentCode
    3090781
  • Title

    The Technology Optimum and Reaction Dynamics of the Simulative Explosive Industrial Wastewater Degradation in Supercritical (Sub-Critical) Water

  • Author

    Ma, Yanhua ; Zhu, Xian ; Tian, Ling ; Yang, Lei ; Liu, Xiaolei ; Shen, Yijing

  • Author_Institution
    Dept. of Chem. Eng., Shanghai Univ., Shanghai, China
  • fYear
    2010
  • fDate
    18-20 June 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Supercritical(sub-critical) water oxidation technology is applied to degrade the explosive wastewater and low its chemical oxygen demand (COD). The technology optimum and reaction dynamics of TNT, RDX, HMX degradation have been investigated. The experiment results show that the optimum degradation technology is: reaction temperature T=648K, reaction time t=5min, the volume proportion of waste water and oxidant H2O2=10:1. Under this condition, COD is 38mg/L and the degradation ratio of COD for TNT, RDX, HMX is up to 98.7%. The results of reaction dynamics show that the velocity constants are 0.0103, 0.0208, 0.0384, and 0.0466 at 573K, 603K, 623K, and 653K respectively. The active energy, pre-exponential factor and average reaction kinetics order are 60.8kJ/mol, 3.84×103, and 1.56 respectively.
  • Keywords
    environmental degradation; industrial waste; oxidation; reaction kinetics; wastewater treatment; COD; chemical oxygen demand; explosive industrial wastewater; reaction dynamics; reaction kinetics; supercritical water; temperature 648 K; time 5 min; wastewater degradation; water oxidation technology; Chemical industry; Chemical technology; Degradation; Explosives; Inductors; Kinetic theory; Oxidation; Temperature; Wastewater; Water pollution;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bioinformatics and Biomedical Engineering (iCBBE), 2010 4th International Conference on
  • Conference_Location
    Chengdu
  • ISSN
    2151-7614
  • Print_ISBN
    978-1-4244-4712-1
  • Electronic_ISBN
    2151-7614
  • Type

    conf

  • DOI
    10.1109/ICBBE.2010.5514991
  • Filename
    5514991