• DocumentCode
    3094434
  • Title

    Design methodology of high performance on-chip global interconnect using terminated transmission-line

  • Author

    Zhang, Yulei ; Zhang, Ling ; Deutsch, Alina ; Katopis, George A. ; Dreps, Daniel M. ; Buckwalter, James F. ; Kuh, Ernest S. ; Cheng, Chung-Kuan

  • Author_Institution
    ECE Dept., Univ. of California, San Diego, CA
  • fYear
    2009
  • fDate
    16-18 March 2009
  • Firstpage
    451
  • Lastpage
    458
  • Abstract
    We explore two schemes using transmission-line (T-line) to achieve high-performance global interconnects on VLSI chips. For both schemes, we select wire dimensions to ensure T-line effects present and employ inverter chains as drivers and receivers. In order to achieve high throughput and alleviate Inter-Symbol Interference (ISI), high termination resistance is used in the second scheme. For the two schemes, we discuss how to optimize the wire dimensions and the effects of driver impedance and termination resistance on the wire bandwidth. Secondly, design methodology is proposed to determine the optimal design variables for three objectives. We adopt the proposed methodology and compare the performance metrics with repeated RC wires. Simulation results show that, the proposed T-line schemes reduce the delay and improve the throughput as much as 82% and 63%, for min-ddp (delay2-power product) objective.
  • Keywords
    VLSI; electric impedance; integrated circuit design; integrated circuit interconnections; intersymbol interference; transmission lines; T-line effects; VLSI chips; design methodology; driver impedance; high termination resistance; intersymbol interference; on-chip global interconnect; terminated transmission-line; wire bandwidth; wire dimensions; Delay; Design methodology; Impedance; Intersymbol interference; Inverters; Termination of employment; Throughput; Transmission lines; Very large scale integration; Wire; On-chip transmission line; design methodology; global interconnect; termination resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quality of Electronic Design, 2009. ISQED 2009. Quality Electronic Design
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-4244-2952-3
  • Electronic_ISBN
    978-1-4244-2953-0
  • Type

    conf

  • DOI
    10.1109/ISQED.2009.4810337
  • Filename
    4810337