Title :
An analytic model for Ge/Si core/shell nanowire MOSFETs considering drift-diffusion and ballistic transport
Author :
Zhang, Lining ; He, Jin ; Zhang, Jian ; Liu, Feng ; Fu, Yue ; Song, Yan ; Zhang, Xing
Author_Institution :
Shenzhen Grad. Sch., Group of Micro- & Nano-Device & Integrated Technol., Peking Univ., Beijing
Abstract :
In this paper an analytic model for Ge/Si core/shell nanowire MOSFETs (NWFETs) is developed. First, the electrostatic potential and charge model are derived out from classical device physics. Then the drift-diffusion drain current model is obtained and verified by comparisons with the numerical simulation. The ballistic current model is obtained with the approximately described quantum-mechanical effect through modifying the intrinsic carrier concentration under 2-dimensional confinement. With the proposed model, the performances of Ge/Si core/shell NWFETs are analyzed and significant characteristics are demonstrated in details. The analytic model in this paper provides a framework for further developing compact models of the NWFETs with Ge/Si core/shell heterostructure for circuit design and simulation.
Keywords :
MOSFET; ballistic transport; elemental semiconductors; germanium; nanowires; semiconductor device models; silicon; Ge-Si; Ge/Si core/shell; ballistic current model; ballistic transport; carrier concentration; charge model; drift-diffusion transport; electrostatic potential; nanowire MOSFET; quantum-mechanical effect; Analytical models; Ballistic transport; Carrier confinement; Circuit simulation; Circuit synthesis; Electrostatics; MOSFETs; Numerical simulation; Performance analysis; Physics;
Conference_Titel :
Quality of Electronic Design, 2009. ISQED 2009. Quality Electronic Design
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4244-2952-3
Electronic_ISBN :
978-1-4244-2953-0
DOI :
10.1109/ISQED.2009.4810359