Title :
A 4.9-dB NF 53.5–62-GHz micro-machined CMOS wideband LNA with small group-delay-variation
Author :
Chen, Chi-Chen ; Lin, Yo-Sheng ; Huang, Pen-Li ; Chang, Jin-Fa ; Lu, Shey-Shi
Author_Institution :
Dept. of Electr. Eng., Nat. Chi Nan Univ., Puli, Taiwan
Abstract :
A 53.5-62-GHz wideband CMOS low-noise amplifier (LNA) with excellent phase linearity property is reported. Current-sharing technique is adopted to reduce power dissipation. The LNA (STD LNA) consumed 29.1 mW and achieved input return loss (S11) of -10.3~ -19.5 dB, output return loss (S22) of -13.8~ -27.8 dB, forward gain (S21) of 8.1~ 11.1 dB, and reverse isolation (S12) of -49.9~ -60.2 dB over the 53.5-62-GHz-band. The minimum NF (NFmin) is 5.4 dB at 62 GHz. To reduce the substrate loss, the CMOS process compatible backside inductively-coupled-plasma (ICP) deep trench technology is used to remove the silicon underneath the LNA. After the ICP etching, the LNA (ICP LNA) achieved maximum S21 (S21-max) of 13.2 dB, 2.1 dB higher than that (11.1 dB) of the STD LNA. In addition, the ICP LNA achieved NFmin of 4.9 dB, 0.5 dB lower than that (5.4 dB) of the STD LNA. These results demonstrate the proposed LNA architecture in conjunction with the backside ICP technology is very promising for 60-GHz-band RFIC applications.
Keywords :
CMOS analogue integrated circuits; MIMIC; delays; low noise amplifiers; micromachining; millimetre wave amplifiers; sputter etching; ICP etching; RFIC; backside ICP technology; backside inductive-coupled-plasma deep trench technology; current-sharing technique; frequency 53.5 GHz to 62 GHz; input return loss; loss -10.3 dB to -19.5 dB; micromachined CMOS wideband LNA; noise figure 4.9 dB; phase linearity property; power 29.1 mW; power dissipation reduction; small group-delay-variation; wideband CMOS low-noise amplifier; CMOS process; CMOS technology; Gain; Isolation technology; Linearity; Low-noise amplifiers; Noise measurement; Power dissipation; Silicon; Wideband; 60-GHz; CMOS; gain; linearity; low-noise amplifier; wideband;
Conference_Titel :
Microwave Symposium Digest (MTT), 2010 IEEE MTT-S International
Conference_Location :
Anaheim, CA
Print_ISBN :
978-1-4244-6056-4
Electronic_ISBN :
0149-645X
DOI :
10.1109/MWSYM.2010.5515216