Development of the Nano-Measuring Machine stage

Author

Jywe, Wen-Yuh ; Jeng, Yeau-Ren ; Teng, Yun-Feng ; Wang, Hung-Shu ; Wu, Chia-Hung

Author_Institution

Nat. Formosa Univ, Yulin

fYear

2007

fDate

5-8 Nov. 2007

Firstpage

2970

Lastpage

2973

Abstract

In this paper, it was successfully developed a nano- measuring machine stage. It was used the features of a flexible structure to develop the nano-measuring machine stage. This stage includes two parts: one is a long range positioning X-Y stage and the other one is a four degrees-of-freedomicro-range stage. The flexible structure of the four degrees-of-freedom micro-range stage was included two kinds of an arc flexible body and a new two degrees-of- freedom flexible body. The micro-range stage was designed to compensate the moving errors such as vertical straightness error, pitch error and roll errors and its all moving range is 20 mm times 20 mm times 11 mum. Precision feedback is provided by the six degrees-of-freedom measuring system with integrating the three plane mirror interferometers and a two degrees-of-freedom angular sensor.

Keywords

arcs (electric); electric machines; electric sensing devices; least mean squares methods; nanotechnology; precision engineering; angular sensor; arc flexible body; flexible structure; four degrees-of-freedom microrange stage; nanomeasuring machine stage; pitch error; plane mirror interferometers; precision feedback; roll errors; vertical straightness error; Assembly; Capacitance measurement; Capacitive sensors; Coils; Feedback; Flexible structures; Mechanical engineering; Motion measurement; Piezoelectric actuators; Sensor systems;

fLanguage

English

Publisher

ieee

Conference_Titel

Industrial Electronics Society, 2007. IECON 2007. 33rd Annual Conference of the IEEE

Conference_Location

Taipei

ISSN

1553-572X

Print_ISBN

1-4244-0783-4

Type

conf

DOI

10.1109/IECON.2007.4460035

Filename

4460035