DocumentCode :
3096129
Title :
Development of the Nano-Measuring Machine stage
Author :
Jywe, Wen-Yuh ; Jeng, Yeau-Ren ; Teng, Yun-Feng ; Wang, Hung-Shu ; Wu, Chia-Hung
Author_Institution :
Nat. Formosa Univ, Yulin
fYear :
2007
fDate :
5-8 Nov. 2007
Firstpage :
2970
Lastpage :
2973
Abstract :
In this paper, it was successfully developed a nano- measuring machine stage. It was used the features of a flexible structure to develop the nano-measuring machine stage. This stage includes two parts: one is a long range positioning X-Y stage and the other one is a four degrees-of-freedomicro-range stage. The flexible structure of the four degrees-of-freedom micro-range stage was included two kinds of an arc flexible body and a new two degrees-of- freedom flexible body. The micro-range stage was designed to compensate the moving errors such as vertical straightness error, pitch error and roll errors and its all moving range is 20 mm times 20 mm times 11 mum. Precision feedback is provided by the six degrees-of-freedom measuring system with integrating the three plane mirror interferometers and a two degrees-of-freedom angular sensor.
Keywords :
arcs (electric); electric machines; electric sensing devices; least mean squares methods; nanotechnology; precision engineering; angular sensor; arc flexible body; flexible structure; four degrees-of-freedom microrange stage; nanomeasuring machine stage; pitch error; plane mirror interferometers; precision feedback; roll errors; vertical straightness error; Assembly; Capacitance measurement; Capacitive sensors; Coils; Feedback; Flexible structures; Mechanical engineering; Motion measurement; Piezoelectric actuators; Sensor systems;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Industrial Electronics Society, 2007. IECON 2007. 33rd Annual Conference of the IEEE
Conference_Location :
Taipei
ISSN :
1553-572X
Print_ISBN :
1-4244-0783-4
Type :
conf
DOI :
10.1109/IECON.2007.4460035
Filename :
4460035
Link To Document :
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