• DocumentCode
    3097381
  • Title

    Effect of ionization on the bounded and free presheath in magnetic flowing plasmas

  • Author

    Kyu-Sun Chung

  • Author_Institution
    Dept. of Nucl. Eng., Hanyang Univ., Seoul, South Korea
  • fYear
    1996
  • fDate
    3-5 June 1996
  • Firstpage
    272
  • Abstract
    Summary form only given. A fluid model is suggested to analyze the effect of ionization in the bounded and free presheath in magnetized flowing plasmas, which are common features in the edge plasma of fusion devices and in the processing plasma of etching devices. Analytic solutions are derived from one-dimensional fluid equations with arbitrary ionization ratio (/spl beta/) and arbitrary shear viscosity (/spl alpha/). The ionization source is normalized by a free transport source due to the cross field diffusion and the shear viscosity is normalised by the (mass density/spl times/ cross-field diffusivity). Plasma density and flow velocity are obtained analytically in terms of position along the field line, the size of the bounded presheath, Mach number (M/sub /spl infin///spl equiv/V/sub d///spl radic/((ZT/sub e/+T/sub i//m/sub i/))), normalized viscosity (/spl alpha/), and the ionization ratio (/spl beta/). Analytic relations between the ratio (R) of the sheath current and the flow Mach number (M/sub /spl infin//) is determined.
  • Keywords
    ionisation; Mach number; analytic solutions; arbitrary ionization ratio; arbitrary shear viscosity; bounded presheath; cross field diffusion; cross-field diffusivity; edge plasma; etching devices; flow Mach number; flow velocity; fluid model; free presheath; free transport source; fusion devices; ionization; ionization ratio; ionization source; magnetic flowing plasmas; mass density; normalized viscosity; one-dimensional fluid equations; plasma density; processing plasma; shear viscosity; sheath current; Ionization; Magnetic analysis; Magnetic devices; Plasma applications; Plasma density; Plasma devices; Plasma materials processing; Plasma sources; Plasma transport processes; Viscosity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
  • Conference_Location
    Boston, MA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3322-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1996.551533
  • Filename
    551533