DocumentCode :
3097381
Title :
Effect of ionization on the bounded and free presheath in magnetic flowing plasmas
Author :
Kyu-Sun Chung
Author_Institution :
Dept. of Nucl. Eng., Hanyang Univ., Seoul, South Korea
fYear :
1996
fDate :
3-5 June 1996
Firstpage :
272
Abstract :
Summary form only given. A fluid model is suggested to analyze the effect of ionization in the bounded and free presheath in magnetized flowing plasmas, which are common features in the edge plasma of fusion devices and in the processing plasma of etching devices. Analytic solutions are derived from one-dimensional fluid equations with arbitrary ionization ratio (/spl beta/) and arbitrary shear viscosity (/spl alpha/). The ionization source is normalized by a free transport source due to the cross field diffusion and the shear viscosity is normalised by the (mass density/spl times/ cross-field diffusivity). Plasma density and flow velocity are obtained analytically in terms of position along the field line, the size of the bounded presheath, Mach number (M/sub /spl infin///spl equiv/V/sub d///spl radic/((ZT/sub e/+T/sub i//m/sub i/))), normalized viscosity (/spl alpha/), and the ionization ratio (/spl beta/). Analytic relations between the ratio (R) of the sheath current and the flow Mach number (M/sub /spl infin//) is determined.
Keywords :
ionisation; Mach number; analytic solutions; arbitrary ionization ratio; arbitrary shear viscosity; bounded presheath; cross field diffusion; cross-field diffusivity; edge plasma; etching devices; flow Mach number; flow velocity; fluid model; free presheath; free transport source; fusion devices; ionization; ionization ratio; ionization source; magnetic flowing plasmas; mass density; normalized viscosity; one-dimensional fluid equations; plasma density; processing plasma; shear viscosity; sheath current; Ionization; Magnetic analysis; Magnetic devices; Plasma applications; Plasma density; Plasma devices; Plasma materials processing; Plasma sources; Plasma transport processes; Viscosity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
Conference_Location :
Boston, MA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-3322-5
Type :
conf
DOI :
10.1109/PLASMA.1996.551533
Filename :
551533
Link To Document :
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