Title :
Power handling and temperature coefficient studies in FBAR duplexers for the 1900 MHz PCS band
Author :
Larson, John D., III ; Ruby, SM Richard C ; Bradley, Paul D. ; Wen, SM Joe ; Kok, Shong-Lam ; Chien, Allen
Author_Institution :
Electron. Res. Lab., Agilent Technol. Inc., Palo Alto, CA, USA
Abstract :
Duplexers for 1900 MHz PCS handsets based on FBARS have been realized by micro-machined thin film AlN devices. A major advantage of the FBAR duplexer is a 10-fold reduction in physical volume compared to that of dielectric types. However, since the RF input power to the transmit (Tx) filter remains at levels up to +29 dBm input, the Poynting power density is ~1 kWatts/cm2 with concomitantly large RF strain RF levels. The in-band insertion loss for the entire multi-element Tx ladder filter is~3 dB (343 mW dissipated maximum), which results in a volume power dissipation per FBAR~1 MWatts/cm3 . Power densities of this order can lead to 1) frequency shifts due to heating, 2) long term degradation, 3) strain levels approaching the fracture limit of the thin films comprising the FBAR, and 4) thermal destruction of the Tx filter FBARS. We discuss two methods to measure the temperature coefficient of frequency: 1) probing individual FBAR resonators on a hot chuck, or 2) heating packaged duplexers in an oven. The measured resonator frequency temperature coefficient is~27 ppm/°C, while the duplexer Tx response shows a somewhat lower value. Self-heating temperatures can be estimated from this and the observed frequency shift, and were also measured by infrared microscopy. Next, we present preliminary results on the duplexer power handling capabilities, based on a small sample of parts. The Tx devices will withstand up to +36 dBm (4 Watts) input power without destruction. Above this, catastrophic failures can be observed. A scanning electron micrograph example illustrating a catastrophic failure in the duplexer Tx filter will be presented. Finally, we will discuss the effects of high power (+30 to +36 dBm) on duplexer performance. At present we do NOT observe any long term, cumulative effects which could lead to catastrophic failures. Our observations support a model in which device characteristics shift slightly with time
Keywords :
UHF filters; acoustic microwave devices; acoustic resonator filters; aluminium compounds; bulk acoustic wave devices; cellular radio; crystal filters; crystal resonators; failure analysis; fracture; internal stresses; micromachining; optical microscopy; piezoelectric semiconductors; piezoelectric thin films; scanning electron microscopy; semiconductor device testing; semiconductor thin films; -3 dB; 1900 MHz; AlN; FBAR duplexers; FBARS; PCS band; PCS handsets; Poynting power density; RF input power; RF strain; catastrophic failure; fracture limit; frequency shifts; hot chuck; in-band insertion loss; infrared microscopy; long term degradation; micro-machined thin film AlN devices; multi-element Tx ladder filter; packaged duplexers; physical volume; power handling; resonator frequency temperature coefficient; scanning electron micrograph; self-heating temperatures; temperature coefficient; transmit filter; volume power dissipation; Capacitive sensors; Dielectric thin films; Film bulk acoustic resonators; Filters; Frequency estimation; Frequency measurement; Heating; Personal communication networks; Radio frequency; Temperature measurement;
Conference_Titel :
Ultrasonics Symposium, 2000 IEEE
Conference_Location :
San Juan
Print_ISBN :
0-7803-6365-5
DOI :
10.1109/ULTSYM.2000.922680