Diagnostics of charged particles impinging on electrode in RF and microwave discharges

The main goal of the present work is to measure electron and ion fluxes on electrodes in RF and microwave discharges, and to determine discharge parameters and the mechanism of high frequency field absorption. We designed secondary electron diagnostics in a low pressure capacitive RF discharge and measured the sheath voltage waveform and electron density in the plasma region. Also, we established ion flux diagnostics of microwave discharges in a magnetic field. We studied the exciting wave polarization influence on flux intensity of ions impinging on the substrate. The results allow us to determine experimentally the pressure range where the electron cyclotron resonance (ECR) power absorption mechanism dominates