DocumentCode
309808
Title
Process performance of SDS, high pressure hydrides and solid vaporizer feed materials on a 9500×R ion implanter
Author
Marin, T. ; Boyd, Wendell G., Jr. ; Mcanus, J.
Author_Institution
Appl. Materials, Austin, TX, USA
fYear
1996
fDate
16-21 Jun 1996
Firstpage
307
Lastpage
310
Abstract
Key process performance characteristics of pure As and P hydrides (AsH3 and PH3) from low-pressure, zeolite-packed bottles, known as safe delivery sources (SDS), were investigated on a 9500×R ion implanter. The performance of the SDS source materials was compared to results using hydrides from conventional high-pressure, diluted bottles (HP) and solid vaporizers. The key characteristics tested were; Maximum Beam Currents, Dose Calibration, Depth Profiles, Mass Spectra and Beam Tuning Times. Health and safety issues were extensively investigated throughout the design and implementation of the SDS gas handling system. The SDS source materials were found to be superior to the HP sources for beam current and transfer ratios at all energies. SDS feed materials were superior to solid sources in tuning times (less than 300 sec for all switching combinations) beamline cleanliness and low-energy beam currents
Keywords
beam handling techniques; doping profiles; gases; health hazards; integrated circuit manufacture; ion implantation; mass spectroscopic chemical analysis; materials handling; particle beam diagnostics; safety; 10 to 160 kV; 300 s; 9500×R ion implanter; 31P+ beams; 75As+ beams; AsH3; PH3; beam tuning times; beamline cleanliness; depth profiles; dose calibration; gas handling system; health issues; high pressure hydrides; high-pressure diluted bottles; low-energy beam currents; low-pressure zeolite-packed bottles; mass spectra; maximum beam currents; process performance characteristics; safe delivery sources; safety issues; solid vaporizer feed materials; transfer ratios; tuning times; Ash; Calibration; Feeds; Fluid flow; Gases; Hydrogen; Marine technology; Safety; Solids; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location
Austin, TX
Print_ISBN
0-7803-3289-X
Type
conf
DOI
10.1109/IIT.1996.586270
Filename
586270
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