Pulsed laser deposition of hafnium oxide on quartz substrate

In this paper, we report the experimental investigation of optical properties of HfO₂ (hafnium oxide) thin films grown on quartz substrates by pulsed laser deposition (PLD) method [1]. Cold pressed powders of hafnium oxide (HfO₂ 98% - Aldrich Chem. Co.) were used as the target for deposition process. The transparent quartz substrate was heated up to temperature in the range between 200 and 600 °C. Optical properties of the films were investigated by transmittance in the ultra-violet, visible and near infrared range and photoluminescence spectroscopy. We measure the photo-luminescence spectra and dynamics of luminescence process [2]. The PL spectra contained one strong maximum at 385 nm and the peak intensity decreases rapidly with increasing temperature. Optical properties are closely related to the structure of the hafnium oxide thin films.