DocumentCode :
3098226
Title :
Compact modeling of silicon carbide lateral MOSFETs for extreme environment integrated circuits
Author :
Kashyap, Avinash S. ; Chen, Cheng-Po ; Tilak, Vinayak
Author_Institution :
Gen. Electr. Global Res. Center (GRC), Niskayuna, NY, USA
fYear :
2011
fDate :
7-9 Dec. 2011
Firstpage :
1
Lastpage :
2
Abstract :
Silicon carbide (SiC) based semiconductor devices have been gaining tremendous traction in the last decade due to the inherent material advantages [1]. While most of the efforts in developing SiC devices are focused on discrete power semiconductors, a team at GE GRC is developing SiC based integrated circuits that can be used in extremely high temperature applications such as geothermal drilling, aviation electronics, space exploration etc. [2] This ability of SiC is attributed to its low intrinsic carrier concentration, due to which SiC based devices have leakage currents that are several orders of magnitude lower than their Si counterparts under high ambient temperatures.
Keywords :
MOSFET; high-temperature electronics; integrated circuit modelling; semiconductor device models; silicon compounds; GE GRC; aviation electronics; compact modeling; discrete power semiconductors; extreme-environment integrated circuits; extremely-high-temperature applications; geothermal drilling; leakage currents; low-intrinsic carrier concentration; silicon carbide lateral MOSFET; silicon carbide-based integrated circuits; space exploration; FETs; Integrated circuit modeling; Mathematical model; Silicon; Silicon carbide; Temperature; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium (ISDRS), 2011 International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4577-1755-0
Type :
conf
DOI :
10.1109/ISDRS.2011.6135185
Filename :
6135185
Link To Document :
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