Characterization of substrate anisotropy using substrate integrated waveguide technology

Author

Xi-Cheng Zhu ; Wei Hong ; Ke Wu ; Hou-Xing Zhou

Author_Institution

State Key Lab. of Millimeter Waves, Southeast Univ., Nanjing, China

fYear

2012

fDate

4-7 Dec. 2012

Firstpage

860

Lastpage

862

Abstract

This paper presents an analysis of characterization of substrate material using substrate integrated waveguide (SIW) technology. The advantage of characterization of dielectric anisotropy using SIW technology is that the electric field of SIW exists only along the vertical direction (normal to the substrate surface). Then the permittivity measurement sensitivity of substrate material of SIW methods are compared with other planar-circuit methods, i.e., the stripline and coplanar waveguide (CPW) methods.

Keywords

electric fields; permittivity measurement; substrate integrated waveguides; dielectric anisotropy characterization; electric field; permittivity measurement sensitivity; substrate anisotropy; substrate integrated waveguide technology; substrate material characterization; Coplanar waveguides; Dielectric constant; Dielectric measurements; Stripline; Substrates; Transmission line measurements; Substrate integrated waveguide (SIW); anisotropy; measurement sensitivity; permittivity measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Microwave Conference Proceedings (APMC), 2012 Asia-Pacific

Conference_Location

Kaohsiung

Print_ISBN

978-1-4577-1330-9

Electronic_ISBN

978-1-4577-1331-6

Type

conf

DOI

10.1109/APMC.2012.6421759

Filename

6421759