DocumentCode :
3098464
Title :
One-flux theory of saturated drain current in nanoscale transistors
Author :
Tang, Ting-wei ; Fischetti, Massimo V. ; Jin, Seonghoon ; Sano, Nobuyuki
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Massachusetts, Amherst, MA, USA
fYear :
2011
fDate :
7-9 Dec. 2011
Firstpage :
1
Lastpage :
2
Abstract :
Since M. Lunstrom´s seminal publication in 1997 [1], a large number of publications have appeared attempting to model in compact form the drain current and the backscattering coefficient in silicon MOSFETs. However, very few papers have critically examined the derivation and the explicit expression of ID itself, until a recent analysis by Giusi et al. [2]. In this work, we derive an alternate expression of saturated drain current ID, sat along the line of the one-flux theory of McKelvey et al. [3] based on multiple reflections of carriers at the virtual source (VS).
Keywords :
MOSFET; elemental semiconductors; nanoelectronics; silicon; Si; backscattering coefficient; carrier reflections; nanoscale transistors; one-flux theory; saturated drain current; silicon MOSFET; virtual source; Backscatter; Educational institutions; Scattering; Silicon; Transistors; USA Councils;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium (ISDRS), 2011 International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4577-1755-0
Type :
conf
DOI :
10.1109/ISDRS.2011.6135197
Filename :
6135197
Link To Document :
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