DocumentCode :
3099384
Title :
Advanced 2D latch-up device simulation-a powerful tool during development in the pre-silicon phase
Author :
Bargstadt-Franke, S. ; Oettinger, K.
Author_Institution :
Infineon Technol. AG, Munchen, Germany
fYear :
2001
fDate :
2001
Firstpage :
235
Lastpage :
239
Abstract :
The consideration of parasitic effects like the ESD and latch-up sensitivity of a new technology in the early development phase is not yet established. Calibrated 2D simulation can be used for optimizing the technology according to these parasitic effects yielding to an area optimized protection concept and thus offering the possibility to reduce chip costs. In this paper, we present a 2D latch-up device simulation developed for use in the pre-silicon phase to get an optimized pre-silicon latch-up concept for Infineon´s 0.13 μm technology. Silicon verification shows the excellent simulation quality
Keywords :
CMOS integrated circuits; circuit CAD; circuit optimisation; circuit simulation; electrostatic discharge; integrated circuit design; product development; protection; semiconductor process modelling; sensitivity; technology CAD (electronics); 0.13 micron; 2D latch-up device simulation; 2D latch-up device simulation tool; CMOS technology; ESD sensitivity; SiO2-Si; area optimized protection concept; calibrated 2D simulation; chip costs; development phase; latch-up sensitivity; optimized pre-silicon latch-up concept; parasitic effects; pre-silicon development phase; pre-silicon phase; silicon verification; simulation quality; technology optimization; CMOS technology; Calibration; Cost function; Phase measurement; Protection; Safety; Silicon; Testing; Time measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 2001. Proceedings. 39th Annual. 2001 IEEE International
Conference_Location :
Orlando, FL
Print_ISBN :
0-7803-6587-9
Type :
conf
DOI :
10.1109/RELPHY.2001.922907
Filename :
922907
Link To Document :
بازگشت