DocumentCode :
3100227
Title :
Investigation of self boosting disturbance induced by channel coupling in 3D stacked NAND flash memory
Author :
Kim, Wandong ; Kim, Yoon ; Park, Se-Hwan ; Seo, Joo Yun ; Kim, Do-Bin ; Kim, Seung-Hyun ; Park, Byung-Gook
Author_Institution :
Inter-Univ. Semicond. Res. Center (ISRC), Seoul Nat. Univ., Seoul, South Korea
fYear :
2011
fDate :
7-9 Dec. 2011
Firstpage :
1
Lastpage :
2
Abstract :
As the needs for high density NAND flash memory have been dramatically increasing, the memory density has also increased by scaling down the technology node. As the scaling of NAND flash memory is accelerated, the short channel effect is more severe and further scaling down is faced with process limitations. So, various types of 3D stacked NAND flash memory has been introduced and reported for ultra-high-density data storage and Fig. 1 shows one of the previously reported 3D stacked NAND flash memory structures [1-3]. However, as the distance between layers is reduced, several channel coupling problems are emerging. In this paper, we investigate the self boosting disturbance induced by channel coupling between layers in the 3D stacked NAND flash memory.
Keywords :
NAND circuits; flash memories; 3D stacked NAND flash memory structures; channel coupling; memory density; self boosting disturbance; short channel effect; technology node; ultra-high-density data storage; Boosting; Couplings; Flash memory; Logic gates; Nanostructures; Three dimensional displays; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium (ISDRS), 2011 International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4577-1755-0
Type :
conf
DOI :
10.1109/ISDRS.2011.6135296
Filename :
6135296
Link To Document :
بازگشت