DocumentCode :
3101477
Title :
The impact of process parameter variations on the electrical characteristics of a RESURF LDMOS and its compact modeling
Author :
Fathipour, V. ; Mojab, A. ; Malakoutian, M.A. ; Fathipour, S. ; Fathipour, M.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Tehran, Tehran, Iran
fYear :
2011
fDate :
7-9 Dec. 2011
Firstpage :
1
Lastpage :
2
Abstract :
In this paper, we have investigated the effect of parameter variations on the electrical characteristics of a RESURF LDMOS. The rate of change in each of the electrical parameters such as cut off frequency, breakdown voltage and drain saturation current as a function of the process parameters has been obtained. Furthermore, a model for the device output characteristics is presented and is verified by numerical simulations. To design a high-frequency high-power transistor, an accurate model for the power transistor is required. Several models for the device output characteristics have been proposed [1-3]. A good model should behave properly in all regions of the transistor operation and include the effects of quasi-saturation, a phenomenon commonly seen in power transistors when operating at high gate voltages. The model used here, also includes effects such as self heating and saturation in the N-Drift region.
Keywords :
power MOSFET; N-drift region; RESURF LDMOS; electrical characteristics; high gate voltage; high-frequency high-power transistor; process parameter variation; transistor channel current; transistor operation; Doping; Mathematical model; Numerical models; Resistance; Semiconductor process modeling; Threshold voltage; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium (ISDRS), 2011 International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4577-1755-0
Type :
conf
DOI :
10.1109/ISDRS.2011.6135354
Filename :
6135354
Link To Document :
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