DocumentCode :
3101666
Title :
Analysis of subthreshold characteristics of p-MOSFETs with (0/90°) and 45° channel orientation
Author :
Matsuda, T. ; Hanai, H. ; Asano, F. ; Iwata, H. ; Ohzone, T.
Author_Institution :
Dept. of Inf. Syst. Eng., Toyama Prefectural Univ., Toyama, Japan
fYear :
2011
fDate :
7-9 Dec. 2011
Firstpage :
1
Lastpage :
2
Abstract :
Subthreshold characteristics of CMOS devices become important for mixed signal SOCs (System On a Chip) [1]. Since matching of critical devices in important parameters such as IDsat (saturation drain current), Vτ (threshold voltage), gm (transconductance) and S (subthreshold slope) are important in CMOS analog circuit design, channel orientation and current flow direction should be carefully arranged in LSI design. In this paper, orientation dependence and asymmetry of subthreshold characteristics in 0.18 μm p MOSFET are analyzed using the test structure designed in our previous work [2].
Keywords :
CMOS digital integrated circuits; MOSFET; integrated circuit design; large scale integration; mixed analogue-digital integrated circuits; system-on-chip; CMOS analog circuit design; CMOS devices; LSI design; channel orientation; current flow direction; mixed-signal SOC; orientation dependence; p-MOSFET; saturation drain current; size 0.18 mum; subthreshold characteristic asymmetry; subthreshold slope; system-on-chip; test structure; threshold voltage; transconductance; Capacitance; Educational institutions; Length measurement; Logic gates; MOSFET circuits; Radar; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium (ISDRS), 2011 International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4577-1755-0
Type :
conf
DOI :
10.1109/ISDRS.2011.6135366
Filename :
6135366
Link To Document :
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