Title :
Ion beam surface treatment: a new technique for thermally modifying surfaces using intense, pulsed ion beams
Author :
Stinnett, R.W. ; Buchheit, R.G. ; Neau, E.L. ; Crawford, M.T. ; Lamppa, K.P. ; Renk, T.J. ; Greenly, J.B. ; Boyd, I. ; Thompson, M.O. ; Rej, D.J.
Author_Institution :
Sandia Nat. Labs., Albuquerque, NM, USA
Abstract :
The emerging capability to produce high average power (10-300 kW) pulsed ion beams at 0.2-2 MeV energies is enabling us to develop a new, commercial-scale thermal surface treatment technology called Ion Beam Surface Treatment (IBEST). This new technique uses high energy, pulsed (/spl les/500 ns) ion beams to directly deposit energy in the top 1-20 micrometers of the surface of any material. The depth of treatment is controllable by varying the ion energy and species. Deposition of the energy in a thin surface layer allows melting of the layer with relatively small energies (1-10 J/cm/sup 2/) and allows rapid cooling of the melted layer by thermal conduction into the underlying substrate. Typical cooling rates of this process (109 K/sec) are sufficient to cause amorphous layer formation and the production of non-equilibrium microstructures (nanocrystalline and metastable phases). Results from initial experiments confirm surface hardening, amorphous layer and nanocrystalline grain size formation, corrosion resistance in stainless steel and aluminum, metal surface polishing, controlled melt of ceramic surfaces, and surface cleaning and oxide layer removal as well as surface ablation and redeposition. These results follow other encouraging results obtained previously in Russia using single pulse ion beam systems. Potential commercialization of this surface treatment capability is made possible by the combination of two new technologies, a new repetitive high energy pulsed power capability (0.22 MV, 25-50 kA, 60 ns, 120 Hz) developed at SNL, and a new repetitive ion beam system developed at Cornell University.
Keywords :
amorphisation; focused ion beam technology; ion-surface impact; melting; nanostructured materials; surface cleaning; surface hardening; surface treatment; 0.2 to 2.0 MeV; 1 to 20 mum; 10 to 300 kW; 500 ns; amorphous layer; ceramic surface; controlled melt; cooling rates; corrosion resistance; depth of treatment; intense pulsed ion beams; ion beam surface treatment; melting; metal surface polishing; nanocrystalline grain size formation; non-equilibrium microstructures; oxide layer removal; redeposition; stainless steel; surface ablation and; surface cleaning; surface hardening; thermal conduction; thermally modifying surfaces; Amorphous materials; Cooling; Ion beams; Microstructure; Production; Rapid thermal processing; Surface cleaning; Surface resistance; Surface treatment; Thermal conductivity;
Conference_Titel :
Pulsed Power Conference, 1995. Digest of Technical Papers., Tenth IEEE International
Conference_Location :
Albuquerque, NM, USA
Print_ISBN :
0-7803-2791-8
DOI :
10.1109/PPC.1995.596454