DocumentCode
310830
Title
Scalability Of Plasma Damage With Gate Oxide Thickness
Author
Bayoumi, Amr ; Ma, Shawming ; Langley, Brian ; Cox, Mike ; Tavassoli, Malahat ; Diaz, Carlos ; Cao, Min ; Marcoux, Paul ; Ray, Gary ; Greene, W.
Author_Institution
Hewlett-Packard Co.
fYear
1997
fDate
13-14 May 1997
Firstpage
11
Lastpage
14
Keywords
Dielectrics; Electric breakdown; Implants; Plasma applications; Plasma devices; Plasma materials processing; Plasma sources; Scalability; Testing; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location
Monterey, California, USA
Print_ISBN
0-9651-5771-7
Type
conf
DOI
10.1109/PPID.1997.596669
Filename
596669
Link To Document