DocumentCode :
310832
Title :
Process Induced Charging Damage In Thin Gate Oxides
Author :
Bersuker, Gennadi ; Werking, James ; Kim, Sang
Author_Institution :
SEMATECH
fYear :
1997
fDate :
13-14 May 1997
Firstpage :
21
Lastpage :
24
Keywords :
Antenna measurements; Charge measurement; Current measurement; Electron traps; Fuses; Leakage current; MOSFETs; Protection; Stress measurement; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
Type :
conf
DOI :
10.1109/PPID.1997.596672
Filename :
596672
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=310832
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