DocumentCode

310832

Title

Process Induced Charging Damage In Thin Gate Oxides

Author

Bersuker, Gennadi ; Werking, James ; Kim, Sang

Author_Institution

SEMATECH

fYear

1997

fDate

13-14 May 1997

Firstpage

21

Lastpage

24

Keywords

Antenna measurements; Charge measurement; Current measurement; Electron traps; Fuses; Leakage current; MOSFETs; Protection; Stress measurement; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Process-Induced Damage, 1997., 2nd International Symposium on

Conference_Location

Monterey, California, USA

Print_ISBN

0-9651-5771-7

Type

conf

DOI

10.1109/PPID.1997.596672

Filename

596672