Title :
Topographic Dependence Of Plasma Charging Induced Device Damage
Author :
Vahedi, Vahid ; Benjamin, Neil ; Perry, Andrew
Author_Institution :
Lam Research Corporation
Keywords :
Electrons; Plasma applications; Plasma density; Plasma devices; Plasma sheaths; Radio frequency; Shadow mapping; Surface charging; Surface topography; Voltage;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596683
