DocumentCode

310837

Title

Topographic Dependence Of Plasma Charging Induced Device Damage

Author

Vahedi, Vahid ; Benjamin, Neil ; Perry, Andrew

Author_Institution

Lam Research Corporation

fYear

1997

fDate

13-14 May 1997

Firstpage

41

Lastpage

44

Keywords

Electrons; Plasma applications; Plasma density; Plasma devices; Plasma sheaths; Radio frequency; Shadow mapping; Surface charging; Surface topography; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Process-Induced Damage, 1997., 2nd International Symposium on

Conference_Location

Monterey, California, USA

Print_ISBN

0-9651-5771-7

Type

conf

DOI

10.1109/PPID.1997.596683

Filename

596683