Title :
General Dependence Of Electron Shading Damage On The Wafer Bias Power
Author :
Hashimoto, Koichi ; Shimpuku, Fumihiko ; Hasegawa, Akihiro ; Hikosaka, Yukinobu ; Nakamura, Moritaka
Author_Institution :
Fujitsu Limited
Keywords :
Breakdown voltage; Electric breakdown; Electrons; Etching; Inductors; MOS capacitors; Plasma applications; Plasma sources; Resists; Ultra large scale integration;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596688
