Title :
On the Link Between Electron Shadowing And Charging Damage
Author :
Hwang, Gyeong S. ; Giapis, Konstantinos P.
Author_Institution :
California Institute of Technology
Keywords :
Electrons; Etching; Plasma applications; Plasma chemistry; Plasma density; Plasma materials processing; Plasma simulation; Plasma temperature; Shadow mapping; Tunneling;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596692
