• DocumentCode
    310845
  • Title

    Characteristics Of Contact Etching Damage Affecting The Contact Resistance Of AiSiCu/TiN/Ti/p+Si

  • Author

    Miyamoto, Kyoko ; Sugihara, Kohei ; Asai, Akira

  • Author_Institution
    Matushita Electronics Corporation
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    73
  • Lastpage
    76
  • Keywords
    Contact resistance; Etching; Hafnium; Impurities; Laboratories; Plasma applications; Plasma immersion ion implantation; Plasma measurements; Silicon; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596695
  • Filename
    596695
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310845