• DocumentCode
    310847
  • Title

    Plasma Etching Process Induced Poly Film Damage

  • Author

    Chu, Po-Tao ; Chen, Fang-Cheng ; Hung, Chih-Chien ; Chao, Ying-Chen

  • Author_Institution
    Taiwan Semiconductor Manufacturing Company
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    77
  • Lastpage
    80
  • Keywords
    Etching; Optical films; Optical microscopy; Plasma applications; Plasma materials processing; Production; Random access memory; Scanning electron microscopy; Surfaces; Switches;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596698
  • Filename
    596698
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310847