DocumentCode
310849
Title
Integrated Oxidation/anneal Processes To Treat Out The LDD Side Wall Stress From TEOS Spacer Anisotropic Etch
Author
Ni, Chi-Fu ; Wu, Shen-Jhy ; Chang, Hui-Hua ; Lan, Chao-Yi ; Ho, Yen-Shih ; Harn, Yu-Chi ; Shu, Shun-Liang
Author_Institution
Taiwan Semiconductor Manufacturing Company Ltd
fYear
1997
fDate
13-14 May 1997
Firstpage
85
Lastpage
88
Keywords
Anisotropic magnetoresistance; Annealing; CMOS image sensors; CMOS process; Crystallization; Electrons; Etching; Oxidation; Plasma applications; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location
Monterey, California, USA
Print_ISBN
0-9651-5771-7
Type
conf
DOI
10.1109/PPID.1997.596701
Filename
596701
Link To Document