DocumentCode :
310851
Title :
A Study Of Plasma-induced Charging Damage Using Various Carrier Injection Conditions And Time-expanded Waveform Approach
Author :
Bhuva, B. ; Janapaty, V. ; Kerns, S. ; Bui, N.
Author_Institution :
Vanderbilt University
fYear :
1997
fDate :
13-14 May 1997
Firstpage :
95
Lastpage :
98
Keywords :
Breakdown voltage; Charge carrier processes; Degradation; Dielectric breakdown; Etching; MOS devices; Plasma applications; Plasma devices; Plasma waves; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
Type :
conf
DOI :
10.1109/PPID.1997.596703
Filename :
596703
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=310851
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