• DocumentCode
    310851
  • Title

    A Study Of Plasma-induced Charging Damage Using Various Carrier Injection Conditions And Time-expanded Waveform Approach

  • Author

    Bhuva, B. ; Janapaty, V. ; Kerns, S. ; Bui, N.

  • Author_Institution
    Vanderbilt University
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    95
  • Lastpage
    98
  • Keywords
    Breakdown voltage; Charge carrier processes; Degradation; Dielectric breakdown; Etching; MOS devices; Plasma applications; Plasma devices; Plasma waves; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596703
  • Filename
    596703
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310851