• DocumentCode
    310857
  • Title

    MERIE Induced Flatband Shifts Of MNOS Devices

  • Author

    Bjorkman, C.H. ; Shan, H. ; Welch, M. ; Sambei, T. ; Hori, T. ; Okano, H. ; Namose, I. ; Ikegami, M.

  • Author_Institution
    Applied Materials Inc.
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    115
  • Lastpage
    118
  • Keywords
    Cathodes; Dielectric materials; Dielectric measurements; Etching; Hardware; Plasma applications; Plasma devices; Plasma materials processing; Plasma measurements; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596711
  • Filename
    596711
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310857