مرکز منطقه ای اطلاع رساني علوم و فناوري

DocumentCode :

310859

Title :

Quantifying Via Charging Currents

Author :

Lukaszek, Wes ; Shields, Jeffrey ; Birrell, Andrew

Author_Institution :

Wafer Charging Monitors, Inc.

fYear :

1997

fDate :

13-14 May 1997

Firstpage :

123

Lastpage :

126

Keywords :

Capacitors; Current density; Current measurement; Density measurement; Electrostatic measurements; Plasma applications; Plasma density; Plasma measurements; Resists; Surface charging;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Plasma Process-Induced Damage, 1997., 2nd International Symposium on

Conference_Location :

Monterey, California, USA

Print_ISBN :

0-9651-5771-7

Type :

conf

DOI :

10.1109/PPID.1997.596715

Filename :

596715

Link To Document :

https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=310859