• DocumentCode
    310859
  • Title

    Quantifying Via Charging Currents

  • Author

    Lukaszek, Wes ; Shields, Jeffrey ; Birrell, Andrew

  • Author_Institution
    Wafer Charging Monitors, Inc.
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    123
  • Lastpage
    126
  • Keywords
    Capacitors; Current density; Current measurement; Density measurement; Electrostatic measurements; Plasma applications; Plasma density; Plasma measurements; Resists; Surface charging;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596715
  • Filename
    596715
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310859