• DocumentCode
    310863
  • Title

    Structural Effects On Charging Damage

  • Author

    Muraki, Y. ; Hosoda, S.

  • Author_Institution
    Tokyo Electron Ltd.
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    139
  • Lastpage
    142
  • Keywords
    Antenna measurements; Dry etching; Electrons; Fabrication; Ion implantation; Plasma applications; Plasma immersion ion implantation; Plasma measurements; Resists; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596720
  • Filename
    596720
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310863