مرکز منطقه ای اطلاع رساني علوم و فناوري

DocumentCode :

310863

Title :

Structural Effects On Charging Damage

Author :

Muraki, Y. ; Hosoda, S.

Author_Institution :

Tokyo Electron Ltd.

fYear :

1997

fDate :

13-14 May 1997

Firstpage :

139

Lastpage :

142

Keywords :

Antenna measurements; Dry etching; Electrons; Fabrication; Ion implantation; Plasma applications; Plasma immersion ion implantation; Plasma measurements; Resists; Testing;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Plasma Process-Induced Damage, 1997., 2nd International Symposium on

Conference_Location :

Monterey, California, USA

Print_ISBN :

0-9651-5771-7

Type :

conf

DOI :

10.1109/PPID.1997.596720

Filename :

596720

Link To Document :

https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=310863